Structure, processes of regulating and
physical properties of some intermetallic compounds
V.Prysyazhnyuk, O.Mykolaychuk
Using methods of thermal vacuum evaporation and magnetron sputtering, amorphous
and polycrystalline films of intermetallic compounds of systems Fe-Gd and
Sc-Cu were obtained. Complex electron diffraction and electrophysical examinations
of condensates were carried out for different types substrates and different
condensing temperatures.
In particular:
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Temperature of substrate and mode of deposition influence
on forming of a condensate is explored.
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The kinetics of crystallization of amorphous films is investigated.
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The proximate interatomic distances in amorphous condensates
are estimated.
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Decoding of structure for polycrystal samples carried out.
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Determined that annealing in vacuum at temperatures smaller
600 K does not result in crystallization.
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Specific resistances of films obtained were gauged under
different technological conditions. Essential effect of deposition conditions
is discovered.
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In the range 300-500 К temperature dependences were built
for an electrical conductivity of amorphous and polycrystalline films.
They had a semiconductor or metal course of conductance depending on methods
of reception and mode of deposition.
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The temperature coefficient of resistance and energy of thermal
activation were calculated.
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Effect of annealing on an electrical conductivity is explored.
The magnification of a specific resistance is detected. This fact could
be explained by formation of nanocrystalline seeds in an amorphous matrix
which gives in increase of localization of such seeds.
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In the range 300-450 К temperature dependences of thermoelectric
power were built.
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The type of carriers was determined. In all cases it there
were electrons.
The carried examinations enable as to state that physical
properties of films depend on structure essentially.